The lab has a Secondary Ion Mass Spectrometer and Atomic Force Microscopy, which enables the lab to provide nano-scale surface analysis for semiconductor, metals, and inorganic substances. The surface analysis includes the determination of molecular chemical composition , detection of element present in ppm level and depth profiling by powerful sputtering process. The lab performs XRD, a X-ray analysis, to characterize the element and crystalline phase composition of samples.
Key activities
- Particle shape, size and height on the surface of materials
- Quantitative assessment of surface roughness
- To determine elemental and molecular chemical composition of the surface
- - Analysis of crystal structure using X-ray systeme